Rhodium phosphate plating solution RJ100P

This phosphate based concentrate has been specially developed for decorative applications. It will produce bright, white lustrous deposits at thicknesses below 0.5 µm. The recommended maximum thickness is 1 µm.

Availability
Available in the following pack sizes:

2 g rhodium content (20 ml)
4 g rhodium content (40 ml)
10 g rhodium content (100 ml)
Other pack sizes can be supplied as required.

Bath preparation
Typical requirements for 1 litre solution:
Demineralised or distilled water: 800 ml
Concentrated sulphuric acid: 20 ml (added cautiously to the water with stirring)
RJ100P: 20 ml

Metal preparation
All components must be thoroughly degreased using trichloroethylene or a similar solvent. Immediately prior to plating the parts should be immersed in dilute sulphuric acid (5 % v/v).

Plating Conditions

Rhodium content: 1.5 g - 2.5 g/l

Sulphuric acid content: 10 - 40 ml/l

Temperature: 20°C - 60°C (optimum 40°C)

Cathode current density: Up to 8 A/dm² (optimum 2 A/dm²)

Current efficiency: 12 % at optimum current density